Wafer leve nanoimprint master | Nanoimprint master base on metal | Other nanoimprint master
Wafer level templates are one of the most commonly used templates, and the processing method is also the most common processing method based on photolithography and etching.Because typical contact exposure, laser direct writing, and electron beam lithography are based on wafers, they are collectively referred to as wafer-level templates.Its application is also the most extensive, such as the current hot micro-nano optics (including DOE, TOF and AR/VR, etc.), physical and chemical basic research, anti-counterfeiting identification, biochip and other fields.
This type of template is usually processed by rotating photoresist onto the wafer and using conventional lithography methods to obtain a photoresist eye plate, and subsequent dry etching process to protect a specific area to form a certain depth to obtain a specific pattern shape.See Wafer Level Template Processing for more details.
Wafer level templates are one of the most commonly used templates, and the processing method is also the most common processing method based on photolithography and etching.Because typical contact exposure, laser direct writing, and electron beam lithography are based on wafers, they are collectively referred to as wafer-level templates.Its application is also the most extensive, such as the current hot micro-nano optics (including DOE, TOF and AR/VR, etc.), physical and chemical basic research, anti-counterfeiting identification, biochip and other fields.
Using a laser, gray direct writing, glass micro-nano 3 d printing, two-photon polymerization method such as 3 d printing for polymer materials can be processed or glass or other two-dimensional surface structure, its structure size usually is micron grade, contour error limits and surface quality and the cost of high correlation, effective area from several millimeter to centimeter level.
