Compact Nanoimprint

– CNI v3.0 –

— A desktop nanoimprint tool for easy replication of micro- and nanoscale structures —

  • The starting point of nano-replication

    A compact nanoimprint tool that can be used for both imprinting and hot embossing. Plug and play in just 20 minutes

  • Replication in a box

    The CNI tool allows for replication of micro- and nanostructures from masters to substrates, both thermal replication and UV replication

  • Available in 120 & 210 mm versions

    Supports masters and substrates up to 120 and 210 mm. Both versions support thermal imprint up to 250°C and UV imprint at 365 nm and/or 405 nm

  • Ease of use

    Robust and simple to operate. It facilitates non-standard processes and new experiments as well as mature and advanced development

How to use the CNI v3.0？

Supports many technologies

  • Thermal nanoimprint
  • UV nanoimprint
  • Hot embossing
  • µ-contact printing
  • Polymer bonding

Examples of use

  • Imprint of nanostructures
  • Imprint of microstructures
  • Imprint of gratings with nm pitch on silicon
  • Imprint on fragile substrates (e.g. III-V materials, InP)
  • Production of working stamps
  • Hot embossing of high aspect ratio structures
  • Hot embossing of polymer sheets
  • Thermal polymer bonding

Get more information

More information about tool？

requirements of nanoimprint template？

other specifications?

Get in touch with us:

Get in touch

Find the right CNI version for your needs!

— 120mm HTH | 210 HTH+UV 365 | 120mm heater+UV 365+UV 405 | 210mm+UV 365 | 120mm UV 365 —

The CNI tool is available in 20 different configurations depending on your needs. You have to decide whether you need the big chamber and what kind of UV exposure and temperature range you need.

See the different configurations and get a quote for your CNI by contact with us!

Brochure

CNI V3.0 210mm HTH

CNI V3.0 210 HTH+UV 365

CNI V3.0 210mm+UV 365

CNI V3.0 120mm UV 365

CNI V3.0 120mm heater+UV 365+UV 405

CNI-replication in 4-level polymer (device) with steep side walls, sharp corners and low roughness. Polymer coated with Au prior to obtaining SEM.

The SEM image shows a replication we did in collaboration with Johns Hopkins University. This is chromium dots on silicon after lift-off. The pattern was thermal imprinted in the CNI tool using mr-I8000 series resist from MicroResist. The smallest dots are 100 nm diameter.

If you have any questions, Get in touch with us!

Sim Micro & Nano has opened email, phone, linkedin, WeChat and other contact channels. You can choose the most suitable contact channels for you to directly communicate with us, and we will reply to your inquiry as soon as possible.Thank you for your trust and support!

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